JPH0258766B2 - - Google Patents

Info

Publication number
JPH0258766B2
JPH0258766B2 JP56104453A JP10445381A JPH0258766B2 JP H0258766 B2 JPH0258766 B2 JP H0258766B2 JP 56104453 A JP56104453 A JP 56104453A JP 10445381 A JP10445381 A JP 10445381A JP H0258766 B2 JPH0258766 B2 JP H0258766B2
Authority
JP
Japan
Prior art keywords
position detection
wafer
reticle
detector
projection device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56104453A
Other languages
English (en)
Japanese (ja)
Other versions
JPS587823A (ja
Inventor
Susumu Komorya
Hiroshi Maejima
Nobuyuki Irikita
Hiroto Nagatomo
Takayoshi Oosakaya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP56104453A priority Critical patent/JPS587823A/ja
Publication of JPS587823A publication Critical patent/JPS587823A/ja
Publication of JPH0258766B2 publication Critical patent/JPH0258766B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP56104453A 1981-07-06 1981-07-06 アライメント方法およびその装置 Granted JPS587823A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56104453A JPS587823A (ja) 1981-07-06 1981-07-06 アライメント方法およびその装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56104453A JPS587823A (ja) 1981-07-06 1981-07-06 アライメント方法およびその装置

Publications (2)

Publication Number Publication Date
JPS587823A JPS587823A (ja) 1983-01-17
JPH0258766B2 true JPH0258766B2 (en]) 1990-12-10

Family

ID=14381032

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56104453A Granted JPS587823A (ja) 1981-07-06 1981-07-06 アライメント方法およびその装置

Country Status (1)

Country Link
JP (1) JPS587823A (en])

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59161815A (ja) * 1983-03-07 1984-09-12 Nippon Kogaku Kk <Nikon> 投影露光装置
JPH0612751B2 (ja) * 1983-03-17 1994-02-16 日本精工株式会社 露光装置における位置合わせ装置
JPH0727853B2 (ja) * 1983-08-10 1995-03-29 日本電信電話株式会社 縮小投影露光方法
JPS6338353Y2 (en]) * 1984-12-26 1988-10-11
JPS62199031A (ja) * 1986-02-27 1987-09-02 Rohm Co Ltd 露光装置
JPS62213123A (ja) * 1986-03-14 1987-09-19 Canon Inc 照度分布測定方法および装置
JPH10294268A (ja) * 1997-04-16 1998-11-04 Nikon Corp 投影露光装置及び位置合わせ方法
JP2002139847A (ja) * 2000-10-31 2002-05-17 Nikon Corp 露光装置、露光方法及びデバイス製造方法
TWI553701B (zh) 2003-10-09 2016-10-11 尼康股份有限公司 Exposure apparatus and exposure method, component manufacturing method
NL2002998A1 (nl) * 2008-06-18 2009-12-22 Asml Netherlands Bv Lithographic apparatus.

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS602772B2 (ja) * 1976-11-01 1985-01-23 株式会社日立製作所 露光装置
DE2722958A1 (de) * 1977-05-20 1978-11-23 Siemens Ag Verfahren zur justierung einer halbleiterscheibe relativ zu einer bestrahlungsmaske bei der roentgenstrahl-fotolithografie

Also Published As

Publication number Publication date
JPS587823A (ja) 1983-01-17

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